Sputtering & Evaporation System, Bestec, GMBH
Specification:
- Sputtering chamber with 4 DC sources, 2 RF sources and Ion beam source for milling
- Evaporation chamber with 2 thermal sources (high and low temp.) and 1 e-beam source with 4 crucibles and thickness monitor
- Sample temperature control up to 8000C.
- Joined load lock chamber with sample caste for 4 sample holder up to 4” sample/wafer
- 4” wafer sample holder
For more information please contact Mr. Moshe Feldberg
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