Institute for Nanotechnology and Advanced Materials - Bar-Ilan University - ALD

ALD

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Atomic Layer Deposition, Cambridge, Fiji F200

 

Specification:

  • 4 precursors lines with heated sources
  • 4 gas inlets
  • Turbo pump with APC mechanism for high aspect ratio samples
  • Load lock chamber
  • 8” sample holder

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

For more information please contact Dr. Yosi Abulafia

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